Partners: Silesian University of Technology, Faculty of Automatic Control, Electronics and Computer Science, Institute of Electronics


  • Expertise & Current Research Activities

  • Facilities

  • Participant

  • Optimization of technology of preparation of ultra thin films of metal oxides for potential application as gas sensors: UHV thermal Evaporation, Sputtering, Spin Coating
  • Microstructural, morphological and chemical characterization of ultra thin films of metal oxides: XPS with depth profiling, TDS; AFM
  • Fabrication of layered structures with different growth process and technologies for SAW gas sensors; characterization of acoustoelectric interactions.

  • Fabrication of gas sensors nanomaterials and nanostructures (metal oxides): UHV thermal Evaporation, Sputtering, Spin Coating
  • Characterization of nanomaterials: XPS with depth profiling, TDS; AFM, CPD
  • Acoustoelectric characterization of SAW gas sensors arrays
  • Test facility for gas/vapour exposure of sensors upon controlled ambient simultaneously.

foto

KWOKA Monika
Lab.: Institute of Electronics
Org.: Silesian University of Technology
Country: Poland
Tel. +48 322372057 - Fax +48 322372057
e-Mail monika.kwoka@polsl.pl
Web http://iele.polsl.pl/iele/zaklady/zmin/



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